17.01.2024
Presentation with Synopsys Inc at SPIE AR/VR/MR
Modeling tools for use of displacement Talbot lithography for high volume AR waveguide manufacturing
Modeling tools for use of displacement Talbot lithography for high volume AR waveguide manufacturing
EULITHA AG and Synopsys Inc teams will be presenting their collaborative work on simulating AR waveguide manufacturing using Displacement talbot lithography January 29th at SPIE AR/VR/MR.
Authors: Kelsey Wooley, maryvonne chalony, Andrew Dawes, Zhixin (Jason) Wang, Harun Solak, and Larry Melvin
