Lithography for photonics

Eulitha, a pioneer in nanofabrication solutions, offers a range of innovative lithography solutions, especially for high-volume production of high-resolution periodic structures. In addition to our groundbreaking PHABLE™ (PHOTONICS ENABLER) product lines such as PhableR, PhableX and PhableS, we also provide support of their use through capability demonstrations, mask manufacturing, computational lithography and application support services.

PHABLE™ is our brand of lithography solutions for production of photonics devices. It encompasses process, hardware and software components that enable high volume production of photonic patterns. PHABLE™ integrates seamlessly with existing infrastructure and is fully supported by Eulitha experts globally for your applications.

Displacement Talbot Lithography (DTL) method invented and developed by Eulitha utilizes the Talbot effect to generate high-precision periodic nanostructures with high throughput. The Talbot effect produces self-imaging patterns at specific distances from the origin.

Use of Eulitha’s lithography technology in photonics applications is unlimited, because the periodic structures that we produce such as linear gratings and 2D arrays are essential in creation, manipulation and sensing of light. We offer cost-effective and scalable solutions addressing the manufacturing needs of new and emerging photonic technologies.