SPIE Photomask Technology + Extreme Ultraviolet Lithography
1 – 5 October 2023
Monterey, California, United States

Synopsys Inc and EULITHA AG are sharing their collaboration on new simulation capabilities and comparing displacement Talbot to traditional lithography in a presentation October 3rd at 9:30AM.

Titled: Displacement Talbot Lithography Process Simulation Analysis

Authored by: Andrew Dawes, Zhixin (Jason) Wang, Kelsey Wooley, Lawrence Melvin, Harun Solak, Bernd Keuchler, Wolfgang Demmerle, and Al Blais